The Logitech EP1 Plain Polishing Pad, 16 in, Single Pad (0CON-481) is a porous expanded polyurethane pad for Chemical Mechanical Polishing of hard materials. This 16 in / 400 mm EP1-P pad combines a plain polishing surface, pressure-sensitive adhesive backing and a controlled-cell foamed elastomer structure for use with Logitech LP70, Akribis-Air and Tribo systems.
Key Features
- Large 16 in / 400 mm diameter, sized for compatible Logitech production and research polishing systems
- Plain EP1-P polishing surface, recommended for polishing surfaces smaller than 20 cm²
- Controlled-cell foamed elastomer structure, providing the high hardness required for hard-material polishing
- Pressure-sensitive adhesive backing, supporting secure application to a clean, smooth and flat base plate
- High-hardness polishing response, with Shore A hardness of 96 and Shore D hardness of 46
- Controlled mechanical properties, with 0.70 g/cm³ density, 7.5% compressibility and 93% elastic rebound
- Efficient abrasive retention, helping maintain polishing action and consistent surface finishing
- Suitable for demanding materials, including silicon, sapphire and optical substrates
- Multi-system compatibility, confirmed for Logitech LP70, Akribis-Air and Tribo systems
- Single-pad supply format, suitable for individual pad replacement requirements
Benefits
- Improves planarity and surface-finish consistency when processing hard semiconductor and optical materials.
- Provides a suitable plain-pad configuration for samples and polishing surfaces below 20 cm².
- Supports predictable polishing performance through controlled compressibility and high elastic rebound.
- Helps minimise pad movement during processing through its pressure-sensitive adhesive backing.
- Allows one pad type to be used across several compatible Logitech polishing platforms.
Why Choose the Logitech EP1 Plain Polishing Pad, 16 in, Single Pad (0CON-481)?
The Logitech EP1 Plain Polishing Pad, 16 in, Single Pad (0CON-481) combines high hardness, controlled compression and efficient abrasive retention for precision CMP of silicon, sapphire and optical materials. John Morris Group supplies this Logitech polishing consumable to Australian semiconductor, optoelectronics and advanced-material laboratories.
