The Logitech LogiPol CMD30 Polishing Slurry, 3 µm, 3.78 L (0CON-509) is a colloidal mono diamond polishing fluid developed for hard material substrates. It is suitable for polishing silicon carbide, silicon, alumina and ceramic materials in semiconductor and opto-electronic processing applications.
Key Features
- Fine 3 µm diamond size, providing a defined abrasive grade for precision polishing processes
- Colloidal mono diamond formulation, combining diamond with colloidal silica, IPA and water
- Suitable for hard material substrates, including silicon carbide, silicon, alumina and ceramics
- Supplied in a 3.78 L pack, providing a practical volume for laboratory and production polishing workflows
- White-grey and odourless suspension, according to the current Logitech technical data sheet
- Near-neutral pH range, specified at pH 7-9 when measured at 20°C
- Defined suspension density, specified at 1.2 g/cm³
- Known thermal properties, with a melting point of 0°C and boiling point of 100°C
- Agitation recommended before use, with continued agitation potentially beneficial during some polishing processes
- Direct fluid delivery supported, with pumping to the point of use recommended due to the suspension viscosity
- Controlled storage guidance, requiring the original packaging and a dry, cool, moisture-free location
- Documented unopened shelf life, with a 12-month expiry when stored correctly
Note: Refer to the current Logitech Safety Data Sheet before use and follow applicable workplace handling, storage and disposal requirements.
Benefits
- Supports precision polishing of several commonly processed hard substrate materials with one defined suspension.
- Helps laboratories integrate diamond polishing into semiconductor and opto-electronic sample preparation workflows.
- Promotes more consistent abrasive distribution when the suspension is properly agitated before and during use.
- Allows efficient delivery to the polishing point through direct fluid pumping where appropriate for the process.
- Provides documented physical properties that assist with storage, handling and process planning.
- Offers a 3.78 L pack size suited to regular laboratory use and ongoing materials-processing operations.
Why Choose the Logitech LogiPol CMD30 Polishing Slurry, 3 µm, 3.78 L (0CON-509)?
The Logitech LogiPol CMD30 combines a defined 3 µm colloidal mono diamond formulation with suitability for silicon carbide, silicon, alumina and ceramic substrates. Its documented handling and physical properties support controlled use in demanding polishing workflows. Purchase 0CON-509 from John Morris Group for product selection and supply support across Australia.
