The Logitech LogiPol CMD30 Polishing Slurry, 3 µm, 18.9 L (0CON-508) is a colloidal mono-diamond slurry developed for polishing hard and extremely hard materials. It supports both bulk material removal and final polishing applications, including processes requiring optical-level surface results.
Key Features
- Defined 3 µm diamond grade, using colloidal mono-diamond abrasive particles for hard-material polishing processes
- Large 18.9 L supply format, suitable for repeat laboratory and production polishing workflows
- Designed for demanding substrates, including silicon, silicon carbide, alumina, ceramics, sapphire, GaN and AlN
- Suitable for multiple preparation stages, supporting both bulk removal and final polishing
- Broad sample compatibility, with applications covering geological thin sections, metals and metal alloys
- Compatible with Logitech polishing media, for use with a wide range of Logitech polishing pads and related media
- White-grey and odourless formulation, providing readily identifiable physical characteristics
- Controlled pH range, specified at pH 7-9 when measured at 20 °C
- Composite polishing formulation, containing diamond, colloidal silica, IPA and water
- Defined physical properties, with a density of 1.2 g/cm³, melting point of 0 °C and boiling point of 100 °C
- Agitation before use, with continued agitation advised where required by the polishing application
- Direct point-of-use delivery, with pumping recommended to support handling of the slurry viscosity
- Not classified as a hazardous mixture, according to the current Logitech technical data sheet
- Specified 12-month shelf life, when correctly stored in an unopened container
Note: Consult the current Logitech Safety Data Sheet before use. Store the slurry in its original packaging in a dry, cool and moisture-free area, provide suitable ventilation or extraction and minimise contact with eyes, skin and clothing.
Benefits
- Supports efficient processing of hard and extremely hard materials where conventional polishing slurries may require long cycle times.
- Allows suitable processes to move from bulk removal to final polishing using the same slurry type.
- Helps laboratories target optical-level polishing results across a broad range of technical materials.
- Provides a defined 3 µm abrasive grade for selecting, documenting and repeating polishing procedures.
- Supports controlled delivery directly to the polishing point when used with an appropriate pumping system.
Why Choose the Logitech LogiPol CMD30 Polishing Slurry, 3 µm, 18.9 L (0CON-508)?
The Logitech LogiPol CMD30 Polishing Slurry combines a defined 3 µm colloidal mono-diamond abrasive with suitability for silicon carbide, silicon, alumina, ceramics and other demanding materials. Purchase 0CON-508 from John Morris Group for access to specialist advice and polishing consumables for laboratory, semiconductor and materials-preparation applications across Australia.
