The Logitech Chemcloth Polishing Cloth, 610 mm, Pack of 10 (0CON-357) is a plain, soft textile-based polishing pad manufactured specifically for chemical mechanical polishing processes. This 24 in (610 mm) variant supports bulk and final polishing across a range of soft and hard semiconductor, optical and engineered materials.
Key Features
- 24 in (610 mm) diameter, providing the specified size for this Chemcloth variant
- Pack of 10 polishing cloths, supplying multiple pads for ongoing processing requirements
- Plain, non-grooved configuration, allowing the pad to be segmented according to sample size and application needs
- Soft textile-based construction, developed for polishing a range of soft and hard materials
- Manufactured specifically for CMP, supporting controlled chemical mechanical polishing workflows
- Black napped urethane surface, providing strong nap retention and extended pad life
- Vertically oriented pore structure, supporting rapid recovery after compression and improved slurry movement
- Efficient abrasive retention, helping hold abrasive at the cloth surface during polishing
- 1.5 mm pad thickness, with a typical weight density of 0.30 g/mL
- Controlled compressive response, with 0.25 mm dynamic deflection and 10–20% dynamic compressibility
- High elastic recovery, with a stated elastic rebound of 93%
- Pressure-sensitive adhesive backing, designed for application to a clean, smooth and flat base plate
- Broad material suitability, including III-V and II-VI semiconductors, silicon, sapphire, optics, silicon carbide and diamond
- Suitable for bulk and final polishing, with final buff polishing recommended for harder materials
Note: Plain pads are typically used for samples smaller than 2 in. For samples of 2 in or larger, the pad should be grooved so slurry can reach the sample centre and waste slurry can be removed effectively.
Benefits
- Supports high-quality surface finishes while helping maintain good sample flatness.
- Provides a versatile polishing surface for materials ranging from soft semiconductors to hard ceramics and diamond.
- Recovers rapidly from polishing pressure to support consistent slurry distribution during processing.
- Allows the plain pad to be segmented according to the sample dimensions and polishing requirements.
- Reduces cross-contamination risks when correctly conditioned and handled with suitable laboratory practices.
- Supplies ten pads in one pack to support routine or production polishing workflows.
Why Choose the Logitech Chemcloth Polishing Cloth, 610 mm, Pack of 10 (0CON-357)?
The Logitech Chemcloth Polishing Cloth, 610 mm, Pack of 10 (0CON-357) combines efficient abrasive retention, controlled compressibility and broad material suitability for CMP, bulk polishing and final polishing. John Morris Group supplies this exact Logitech polishing consumable for precision material-processing applications across Australia.
