Chemcloth Polishing Cloth, 20" / 508mm diameter, pack of 10_1658780
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Logitech Chemcloth Polishing Cloth, 20 in / 508 mm, Pack 10

$9,315.90

The price is inclusive of GST

The Logitech Chemcloth Polishing Cloth, 20 in / 508 mm, Pack 10 (0CON-356) is a plain, textile-based polishing pad designed for chemical mechanical polishing, bulk polishing and final finishing. Each pad is 1.5 mm thick and incorporates a black napped urethane surface, compressible pore structure and pressure-sensitive adhesive backing.

Key Features

  • Plain 20 in / 508 mm pad format, supplied in a pack of 10 for Logitech CDP polishing systems
  • Manufactured specifically for CMP processes, supporting controlled polishing of semiconductor, optical and advanced materials
  • Soft textile-based construction, suitable for bulk and final polishing of softer materials and final buff polishing of harder materials
  • Black napped urethane surface, providing strong nap performance and effective abrasive retention
  • Vertically oriented pore structure, helping slurry move through the pad while reducing pad loading
  • Controlled compressible response, with 10-20% dynamic compressibility, 0.25 mm dynamic deflection and 93% elastic rebound
  • Pressure-sensitive adhesive backing, allowing attachment to a clean, smooth and flat polishing base plate
  • Broad material suitability, including InP, GaAs, GaSb, II-VI semiconductors, silicon, sapphire, optics, silicon carbide and diamond

Note: Plain Chemcloth pads are typically used when the sample is smaller than 2 in. For samples measuring 2 in or larger, Logitech recommends grooving the pad to improve slurry access and waste-slurry removal.

Benefits

  • Supports high-quality surface finishing and flatness through efficient retention of abrasive on the cloth surface.
  • Promotes consistent slurry flow through a compressible substrate that recovers after loading.
  • Helps reduce pad loading and extend useful pad life during production and high-speed polishing operations.
  • Accommodates final polishing of delicate semiconductor materials such as gallium arsenide with Chemlox polishing fluid.
  • Supports polishing under acid and alkaline conditions while simplifying pad installation through the self-adhesive backing.

Why Choose the Logitech Chemcloth Polishing Cloth, 20 in / 508 mm, Pack 10 (0CON-356)?

The Logitech Chemcloth Polishing Cloth, 20 in / 508 mm, Pack 10 (0CON-356) combines a resilient urethane surface with defined compression characteristics for CMP, production polishing and final finishing. Its exact CDP-compatible format, adhesive backing and pack-of-10 supply make it a practical consumable for routine polishing workflows. John Morris Group supplies this verified Logitech polishing cloth for Australian laboratories and materials-processing facilities.

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