The Logitech Chemcloth Polishing Cloth, 350 mm, Pack of 10 (0CON-353) is a plain, soft textile-based pad manufactured for chemical mechanical polishing processes. The 14 in (350 mm) black polishing cloth supports bulk and final polishing across a range of soft and hard materials.
Key Features
- 14 in (350 mm) diameter, providing the specified size for this Chemcloth variant
- Plain, non-grooved configuration, allowing segmentation to suit the sample size and polishing application
- Pack of 10 polishing cloths, supplying multiple pads for ongoing processing requirements
- Soft textile-based construction, developed as a premium pad for polishing both soft and hard materials
- Manufactured specifically for CMP, supporting controlled chemical mechanical polishing processes
- Black textile woven surface, with a napped urethane layer designed for strong nap retention and extended pad life
- Vertically oriented pore structure, supporting rapid recovery after compression and improved slurry movement
- 1.5 mm pad thickness, with a typical weight density of 0.30 g/mL
- Controlled compressive response, with 0.25 mm dynamic deflection and 10–20% dynamic compressibility
- High elastic recovery, with a stated elastic rebound of 93%
- Efficient abrasive retention, helping maintain abrasive at the cloth surface for high-quality finishes and surface flatness
- Pressure-sensitive adhesive backing, enabling the pad to be applied to a clean, smooth and flat base plate
- Broad material suitability, covering III-V and II-VI semiconductors, silicon, sapphire, optics, silicon carbide and diamond
Note: Plain pads are typically used for samples smaller than 2 in. For samples of 2 in or larger, the pad should be grooved so slurry can reach the sample centre and waste slurry can be removed effectively.
Benefits
- Supports both bulk and final polishing, reducing the need for separate cloth types across suitable workflows.
- Helps produce high-quality surface finishes while maintaining good surface flatness.
- Recovers rapidly from polishing pressure to support consistent slurry distribution during processing.
- Allows the plain pad to be grooved according to the sample dimensions and application requirements.
- Provides a versatile consumable for laboratories processing materials ranging from soft semiconductors to hard ceramics and diamond.
Why Choose the Logitech Chemcloth Polishing Cloth, 350 mm, Pack of 10 (0CON-353)?
The Logitech Chemcloth Polishing Cloth, 350 mm, Pack of 10 (0CON-353) combines a compressible textile structure, efficient abrasive retention and broad material suitability for CMP, bulk polishing and final polishing. John Morris Group supplies this exact Logitech polishing consumable for precision materials-processing applications across Australia.
