The MKS SYSTEM 835 Controller is an advanced mass spectrometer system designed to deliver fast, accurate gas analysis from ultra-high vacuum (UHV) up to 10^-5 Torr. Featuring the Granville-Phillips Series 835 Vacuum Quality Monitor (VQM) with an autoresonant ion trap mass spectrometer gauge, this system includes the VQM Controller and VQM Viewer software to convert raw data into actionable process information. With capture rates of 85 ms for 1–145 amu and 125 ms for 1–300 amu, it stands as the world’s fastest, lowest power mass spectrometer. Compact and efficient, the SYSTEM 835 helps identify, monitor, and analyze residual gases to ensure the highest vacuum quality in your process chambers.
Product Features
- Autoresonant ion trap mass spectrometer gauge for precise, real-time analysis
- 1–145 amu measurement in 85 ms, or 1–300 amu in 125 ms
- VQM Controller and VQM Viewer software for real-time data conversion and visualization
- Low power consumption – only 15 watts
- Accurate hydrogen and helium measurement with no zero blast
- Compact design with remote gauge mounting (1–20 meters cable length)
- Easy single-gas calibration using process gases already in your system
- Instant display of normalized, percentage, and absolute partial pressure values for the top 10 prevalent gases
- Data logging supported at all sample rates
Residual Gas Analyzer Comparison
- 20× faster measurement compared to traditional Quadrupole RGAs
- Uses 80% less power
- Smaller and easier to calibrate
- More accurate low amu gas measurement
Benefits
- Full gas spectrum measurement and trend data for deeper process insights
- Compact, low-power design reduces system footprint and operating costs
- High-speed analysis enables real-time monitoring and faster process adjustments
- Easy calibration saves setup time and simplifies maintenance
- Normalized gas ratio data helps ensure vacuum chamber quality and process consistency
Why Choose the MKS SYSTEM 835 Controller?
Purpose-built for precision and speed, the MKS SYSTEM 835 Controller delivers unmatched measurement performance and process insight. Its compact design, ultra-fast capture rates, and low power consumption make it ideal for semiconductor, research, and industrial vacuum applications that demand reliable gas analysis and data-driven process control.
