RF Plasma Generator, 750 W, 13.56 MHz, DeviceNet & Analog, Full Rack_1540969
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MKS RF Plasma Generator, 750 W, 13.56 MHz, DeviceNet & Analog, Full Rack

The MKS RF Plasma Generator delivers 750 Watts of power at 13.56 MHz within a compact air-cooled full rack housing. Equipped with DeviceNet, 25-pin analog, and RS232 interfaces, this generator offers state-of-the-art technology optimized for reliability and superior output performance. Featuring a high-speed closed loop control, a class E RF deck, and a switching modulator, it achieves precise plasma generation ideal for demanding semiconductor, solar, LED, and MEMs applications.

Product Features

  • 750 Watts power output at 13.56 MHz frequency
  • Compact air-cooled full rack housing for efficient heat management
  • Interfaces include DeviceNet, 25-pin analog, and RS232 for versatile communication
  • High-speed closed loop control and class E RF deck for superior output performance
  • Switching modulator enhances power efficiency and reliability
  • Single printed circuit board assembly virtually eliminates internal wires and connectors
  • Designed for continuous operation or stand-alone batch tools
  • Ideal for solar, LED, MEMs, and semiconductor manufacturing applications

Benefits

  • High reliability with reduced internal wiring for minimized failure points
  • Efficient cooling system ensures stable operation under demanding conditions
  • Versatile communication interfaces support integration with various control systems
  • Compact full rack design saves valuable lab and production space
  • Advanced control technology delivers precise plasma generation for quality processing

Why Choose the MKS RF Plasma Generator 750 W, 13.56 MHz, DeviceNet & Analog, Full Rack?

The MKS RF Plasma Generator combines advanced technology with robust design to deliver reliable, precise plasma generation in a compact package. Its multiple interface options and superior control systems make it the ideal choice for high-tech manufacturing environments requiring continuous or batch plasma processes.

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