The Logitech range of polishing cloths provides a comprehensive selection of materials for fine surface polishing of the widest range of sample types.
Logitech Chemical Mechanical Polishing (CMP) cloths are manufactured specifically for CMP processes and are used on various systems including the PM6, LP70, Tribo and Orbis.
Carefully chosen because of texture and for their capability to retain abrasive on the cloth surface in an
efficient and economic manner.
This ensures that samples are produced to the highest quality of surface finish while obtaining the best
possible surface flatness.
EP1
The EP1 has a foamed elastomer structure with controlled cells. Its unique structure and high hardness improves planarity and is designed for optimum polishing of Silicon, Sapphire and optical materials.
Shore A Hardness 97
EP2
The EP2 has a micro-cellular structure that enables it to act in a “sponge like” manner, while maintaining the hardness and flatness. Pads are supplied with a pressure sensitive adhesive backing, excellent flatness control and fast polishing.
Shore A Hardness 86
P (Plain) - Designed for surfaces less than 20cm²
G (Grooved) - Designed for surfaces greater than 20cm²
