Part No: ELS-F125
Worlds First 125kV Ultra High Precision Electron Beam Lithography System
The Elionix ELS-F125 EBL system is a unique system that has changed the face of E-Beam Lithography throughout the nano-technology research world.
The ELS-F125 has been the focus of many renowned scientific papers with a growing install base around the world.
Best Pattern Writing Capabilities
- Line width of 5nm or less is guaranteed at 125kV
- 1.7nm beam diameter & minimum proximity effect at 125kV
High Throughput Capabilities
- Superior large field writing – uniform 10nm lines in entire 600um field
- Small beam diameter at high beam current – 2nm beam diameter at 1nA
- 100mHz scan speed for unrivalled throughput
User Friendly Interface
- CAD and SEM interfaces with WIN7 software
- Easy pattern design function
- Easy control of beam condition
- Small footprint to free up valuable cleanroom space