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Brand: MKS
Part No: LPCVDTrap
Availability: 6-8 weeks

MKS' patented line of HPS® Traps are highly-efficient, compact traps. Each is designed for specific processes in thin film manufacturing. Byproducts are trapped inside, away from the process, pumps, gauging or anything else that can be damaged or clogged by hardened byproducts. When used in conjunction with an Effluent Management Subsystem, the results can include increased uptime, longer pump life, safer cleaning and byproduct disposal, and higher yields.

The Vapor Sublimation Trap is widely used in silicon nitride LPCVD and Titanium nitride LPCVD processes where significant amount of NH4Cl byproducts have been observed in the foreline. An MKS trap, with its high capacity and high efficiency, reduces process downtime, increases process yield (because of its high flow conductance), and protects the vacuum pump.

With the combination of an MKS heated line, heated valve, heated Baratron®, and trap, we can significantly improve the process yield and uptime for the silicon nitride LPCVD process.

Note: Heaters and a heater power cord are needed for NW80 angle models and must be ordered separately.

Every effort has been taken to ensure the completeness and accuracy of MKS Instruments product information. For up to date information on this category from MKS please click here.

OVERVIEW
DOWNLOADS
Brand: MKS
Part No: LPCVDTrap
Availability: 6-8 weeks

MKS' patented line of HPS® Traps are highly-efficient, compact traps. Each is designed for specific processes in thin film manufacturing. Byproducts are trapped inside, away from the process, pumps, gauging or anything else that can be damaged or clogged by hardened byproducts. When used in conjunction with an Effluent Management Subsystem, the results can include increased uptime, longer pump life, safer cleaning and byproduct disposal, and higher yields.

The Vapor Sublimation Trap is widely used in silicon nitride LPCVD and Titanium nitride LPCVD processes where significant amount of NH4Cl byproducts have been observed in the foreline. An MKS trap, with its high capacity and high efficiency, reduces process downtime, increases process yield (because of its high flow conductance), and protects the vacuum pump.

With the combination of an MKS heated line, heated valve, heated Baratron®, and trap, we can significantly improve the process yield and uptime for the silicon nitride LPCVD process.

Note: Heaters and a heater power cord are needed for NW80 angle models and must be ordered separately.

Every effort has been taken to ensure the completeness and accuracy of MKS Instruments product information. For up to date information on this category from MKS please click here.

VAPOR SUBLIMATION TRAP: FOR SEMICONDUCTOR PROCESSES

OVERVIEW
DOWNLOADS
Brand: MKS
Part No: LPCVDTrap
Availability: 6-8 weeks

MKS' patented line of HPS® Traps are highly-efficient, compact traps. Each is designed for specific processes in thin film manufacturing. Byproducts are trapped inside, away from the process, pumps, gauging or anything else that can be damaged or clogged by hardened byproducts. When used in conjunction with an Effluent Management Subsystem, the results can include increased uptime, longer pump life, safer cleaning and byproduct disposal, and higher yields.

The Vapor Sublimation Trap is widely used in silicon nitride LPCVD and Titanium nitride LPCVD processes where significant amount of NH4Cl byproducts have been observed in the foreline. An MKS trap, with its high capacity and high efficiency, reduces process downtime, increases process yield (because of its high flow conductance), and protects the vacuum pump.

With the combination of an MKS heated line, heated valve, heated Baratron®, and trap, we can significantly improve the process yield and uptime for the silicon nitride LPCVD process.

Note: Heaters and a heater power cord are needed for NW80 angle models and must be ordered separately.

Every effort has been taken to ensure the completeness and accuracy of MKS Instruments product information. For up to date information on this category from MKS please click here.

OVERVIEW
DOWNLOADS
Brand: MKS
Part No: LPCVDTrap
Availability: 6-8 weeks

MKS' patented line of HPS® Traps are highly-efficient, compact traps. Each is designed for specific processes in thin film manufacturing. Byproducts are trapped inside, away from the process, pumps, gauging or anything else that can be damaged or clogged by hardened byproducts. When used in conjunction with an Effluent Management Subsystem, the results can include increased uptime, longer pump life, safer cleaning and byproduct disposal, and higher yields.

The Vapor Sublimation Trap is widely used in silicon nitride LPCVD and Titanium nitride LPCVD processes where significant amount of NH4Cl byproducts have been observed in the foreline. An MKS trap, with its high capacity and high efficiency, reduces process downtime, increases process yield (because of its high flow conductance), and protects the vacuum pump.

With the combination of an MKS heated line, heated valve, heated Baratron®, and trap, we can significantly improve the process yield and uptime for the silicon nitride LPCVD process.

Note: Heaters and a heater power cord are needed for NW80 angle models and must be ordered separately.

Every effort has been taken to ensure the completeness and accuracy of MKS Instruments product information. For up to date information on this category from MKS please click here.

Enquiry sent successfully
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