Enquiry sent successfully
Product Enquiry
OVERVIEW
SPECIFICATIONS
DOWNLOADS
Brand: MKS
Part No: GHW12
Availability: 6-8 weeks

MKS, ENI® RF Power Generators provide reliable solid state power for thin films processing equipment. They are vital components of semiconductor fabrication systems, which produce the integrated circuits (ICs) or chips required by modern computers and electronic equipment. ENI RF Generators, combined with our Impedance Matching Network and our V/I Probe form a complete RF Delivery System.

Dynamic Frequency Tuning (DFT) is now available as an option for select MKS RF Plasma Generators. DFT provides near instantaneous impedance tuning and coupled with Advanced Pulsing, accurate power detection with integrated VI Probe provides the most technically advanced product for IC manufacturing.

13.56MHz is the frequency most commonly used for plasma processes. MKS RF plasma generators are the most advanced class of 13.56 MHz generators commercially available. These RF generators are designed for all 13.56MHz applications including, PECVD, HDPCVD, PVD, ALD, etch and strip for the manufacture of integrated circuits, solar cells, flat panel displays, LEDs and data storage devices.

FEATURES INCLUDE:

  • Frequency Stability of ±0.005%
  • Unlimited load impedance range
  • Excellent reliability

GHW RF plasma generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield.

GHW Series RF Plasma Geneators are available at 208 VAC and 400/480 VAC.

FEATURES & BENEFITS:

  • Auto-Frequency Tuning (optional) allows fixed matching networks - faster tuning and lower system cost.
  • Excellent Reliability - increased uptime and lower cost of ownership.
  • Automatic load mismatch protection guards against over-dissipation from adverse loads.
  • Unlimited load impedance range for stable power into any load.

APPLICATIONS:

GHW RF plasma generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.

All MKS Instruments' RF Generators are NRTL certified and CE marked.

Every effort has been taken to ensure the completeness and accuracy of MKS Instruments product information. For up to date information on this category from MKS please click here.

Description Genesis 13.56 MHz, 1.25 kW, RF Plasma Generator
Rated Power Output 10-1,250W
Accuracy ±1.5%
Frequency Stability 13.56 MHz; ±0.005%
dLoad Impedance Range Unlimited
Automatic Frequency Tuning ±5% Bandwidth (optional)
OVERVIEW
SPECIFICATIONS
DOWNLOADS
Brand: MKS
Part No: GHW12
Availability: 6-8 weeks

MKS, ENI® RF Power Generators provide reliable solid state power for thin films processing equipment. They are vital components of semiconductor fabrication systems, which produce the integrated circuits (ICs) or chips required by modern computers and electronic equipment. ENI RF Generators, combined with our Impedance Matching Network and our V/I Probe form a complete RF Delivery System.

Dynamic Frequency Tuning (DFT) is now available as an option for select MKS RF Plasma Generators. DFT provides near instantaneous impedance tuning and coupled with Advanced Pulsing, accurate power detection with integrated VI Probe provides the most technically advanced product for IC manufacturing.

13.56MHz is the frequency most commonly used for plasma processes. MKS RF plasma generators are the most advanced class of 13.56 MHz generators commercially available. These RF generators are designed for all 13.56MHz applications including, PECVD, HDPCVD, PVD, ALD, etch and strip for the manufacture of integrated circuits, solar cells, flat panel displays, LEDs and data storage devices.

FEATURES INCLUDE:

  • Frequency Stability of ±0.005%
  • Unlimited load impedance range
  • Excellent reliability

GHW RF plasma generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield.

GHW Series RF Plasma Geneators are available at 208 VAC and 400/480 VAC.

FEATURES & BENEFITS:

  • Auto-Frequency Tuning (optional) allows fixed matching networks - faster tuning and lower system cost.
  • Excellent Reliability - increased uptime and lower cost of ownership.
  • Automatic load mismatch protection guards against over-dissipation from adverse loads.
  • Unlimited load impedance range for stable power into any load.

APPLICATIONS:

GHW RF plasma generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.

All MKS Instruments' RF Generators are NRTL certified and CE marked.

Every effort has been taken to ensure the completeness and accuracy of MKS Instruments product information. For up to date information on this category from MKS please click here.

Description Genesis 13.56 MHz, 1.25 kW, RF Plasma Generator
Rated Power Output 10-1,250W
Accuracy ±1.5%
Frequency Stability 13.56 MHz; ±0.005%
dLoad Impedance Range Unlimited
Automatic Frequency Tuning ±5% Bandwidth (optional)

GHW SERIES 13.56 MHZ, 1.25, 2.5, AND 5.0 KW: HIGH-RELIABILITY RF PLASMA GENERATORS

OVERVIEW
SPECIFICATIONS
DOWNLOADS
Brand: MKS
Part No: GHW12
Availability: 6-8 weeks

MKS, ENI® RF Power Generators provide reliable solid state power for thin films processing equipment. They are vital components of semiconductor fabrication systems, which produce the integrated circuits (ICs) or chips required by modern computers and electronic equipment. ENI RF Generators, combined with our Impedance Matching Network and our V/I Probe form a complete RF Delivery System.

Dynamic Frequency Tuning (DFT) is now available as an option for select MKS RF Plasma Generators. DFT provides near instantaneous impedance tuning and coupled with Advanced Pulsing, accurate power detection with integrated VI Probe provides the most technically advanced product for IC manufacturing.

13.56MHz is the frequency most commonly used for plasma processes. MKS RF plasma generators are the most advanced class of 13.56 MHz generators commercially available. These RF generators are designed for all 13.56MHz applications including, PECVD, HDPCVD, PVD, ALD, etch and strip for the manufacture of integrated circuits, solar cells, flat panel displays, LEDs and data storage devices.

FEATURES INCLUDE:

  • Frequency Stability of ±0.005%
  • Unlimited load impedance range
  • Excellent reliability

GHW RF plasma generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield.

GHW Series RF Plasma Geneators are available at 208 VAC and 400/480 VAC.

FEATURES & BENEFITS:

  • Auto-Frequency Tuning (optional) allows fixed matching networks - faster tuning and lower system cost.
  • Excellent Reliability - increased uptime and lower cost of ownership.
  • Automatic load mismatch protection guards against over-dissipation from adverse loads.
  • Unlimited load impedance range for stable power into any load.

APPLICATIONS:

GHW RF plasma generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.

All MKS Instruments' RF Generators are NRTL certified and CE marked.

Every effort has been taken to ensure the completeness and accuracy of MKS Instruments product information. For up to date information on this category from MKS please click here.

Description Genesis 13.56 MHz, 1.25 kW, RF Plasma Generator
Rated Power Output 10-1,250W
Accuracy ±1.5%
Frequency Stability 13.56 MHz; ±0.005%
dLoad Impedance Range Unlimited
Automatic Frequency Tuning ±5% Bandwidth (optional)
OVERVIEW
SPECIFICATIONS
DOWNLOADS
Brand: MKS
Part No: GHW12
Availability: 6-8 weeks

MKS, ENI® RF Power Generators provide reliable solid state power for thin films processing equipment. They are vital components of semiconductor fabrication systems, which produce the integrated circuits (ICs) or chips required by modern computers and electronic equipment. ENI RF Generators, combined with our Impedance Matching Network and our V/I Probe form a complete RF Delivery System.

Dynamic Frequency Tuning (DFT) is now available as an option for select MKS RF Plasma Generators. DFT provides near instantaneous impedance tuning and coupled with Advanced Pulsing, accurate power detection with integrated VI Probe provides the most technically advanced product for IC manufacturing.

13.56MHz is the frequency most commonly used for plasma processes. MKS RF plasma generators are the most advanced class of 13.56 MHz generators commercially available. These RF generators are designed for all 13.56MHz applications including, PECVD, HDPCVD, PVD, ALD, etch and strip for the manufacture of integrated circuits, solar cells, flat panel displays, LEDs and data storage devices.

FEATURES INCLUDE:

  • Frequency Stability of ±0.005%
  • Unlimited load impedance range
  • Excellent reliability

GHW RF plasma generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield.

GHW Series RF Plasma Geneators are available at 208 VAC and 400/480 VAC.

FEATURES & BENEFITS:

  • Auto-Frequency Tuning (optional) allows fixed matching networks - faster tuning and lower system cost.
  • Excellent Reliability - increased uptime and lower cost of ownership.
  • Automatic load mismatch protection guards against over-dissipation from adverse loads.
  • Unlimited load impedance range for stable power into any load.

APPLICATIONS:

GHW RF plasma generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.

All MKS Instruments' RF Generators are NRTL certified and CE marked.

Every effort has been taken to ensure the completeness and accuracy of MKS Instruments product information. For up to date information on this category from MKS please click here.

Description Genesis 13.56 MHz, 1.25 kW, RF Plasma Generator
Rated Power Output 10-1,250W
Accuracy ±1.5%
Frequency Stability 13.56 MHz; ±0.005%
dLoad Impedance Range Unlimited
Automatic Frequency Tuning ±5% Bandwidth (optional)
Enquiry sent successfully
Product Enquiry