Part No: Optima® OPT-600
Availability: 6-8 weeks
MKS designs and develops both pulsed and continuous DC power generators with superior arc control circuitry and 0.01% repeatability for improved process yield in thin film applications.
RPG (Reactive Plasma Generators) provide asymmetric bipolar and unipolar pulsed DC power for reactive PVD (Physical Vapor Deposition), CVD (Chemical Vapor Deposition) bias and enhancement coating applications. The RPG line eliminates yield-limiting factors, thus enabling existing PVD tools to produce the high quality, low-defect films needed for next generation processes.
Today's advanced sputtering processes require speed, control, accuracy, improved reliability and sophisticated arc management. Building on the production-proven DCG series, the Optima® is the next generation of MKS high performance DC Plasma power supply systems for Physical Vapor Deposition (PVD) processes.
The design is compact and scalable with 60kW enabled by linking two 20kW Slaves to a 20kW Master. Process reliability and performance are provided by a variety of output regulation modes, user-adjustable settings and control options.
MKS Optima® DC generators meet the demanding power requirements for a variety of thin film applications including; semiconductor, data storage, solar cell and industrial coatings.
FEATURES & BENEFITS
- DSP-Based Control
- ±0.1% Linearity and Accuracy
- <4mJ Micro Arc Energy
- 3U Rack Height per 20kW unit
- Forced Air Cooling
- Interface Flexibility
- Multiple Run Modes
- Higher Yields
- Flexible Operation
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